Numerical Analysis of the Combined Effect of BSF Thickness and Doping on the Performance of an a-Si:H/c-Si SHJ Cells Cell

Jacques Joachim FAYE

Department of Physics and Chemistry, Faculty of Science and Technology, University Iba Der Thiam of Thies / Located at the Northern Bypass Road (VCN) next to the Polytechnic School of Thies, Senegal.

Aly Touré

Department of Physics and Chemistry, Faculty of Science and Technology, University Iba Der Thiam of Thies / Located at the Northern Bypass Road (VCN) next to the Polytechnic School of Thies, Senegal.

Mamadou Lamine SAMB *

Department of Physics and Chemistry, Faculty of Science and Technology, University Iba Der Thiam of Thies / Located at the Northern Bypass Road (VCN) next to the Polytechnic School of Thies, Senegal.

Dimitry Diassy

Department of Physics and Chemistry, Faculty of Science and Technology, University Iba Der Thiam of Thies / Located at the Northern Bypass Road (VCN) next to the Polytechnic School of Thies, Senegal.

*Author to whom correspondence should be addressed.


Abstract

We numerically study how the rear n⁺-a-Si:H Back-Surface-Field (BSF) thickness and doping co-determine the performance of a-Si:H(n⁺)/c-Si(n)/a-Si:H(p⁺) silicon heterojunction (SHJ) solar cells. Using a two-diode formalism coupled to TCAD SILVACO-ATLAS drift–diffusion under AM1.5G and , we sweep a thin BSF window ( ) and its doping ( ) while keeping the optical stack and interface-defect sets fixed to isolate the electrical role of the rear contact. A thin, highly doped BSF reduces rear-surface recombination and strengthens carrier selectivity, yielding a small but systematic Voc increase (  in our setup), a modest  improvement consistent with lower effective series/recombination losses ( ), and a broadly stable . The resulting efficiency  peaks when combining a thin BSF with high doping; by contrast, too-thin layers under-passivate and too-thick layers introduce resistive and potential optical penalties. Modeling includes SRH and Auger recombination with fixed trap sets, standard mobility/bandgap temperature dependences, and constant front/back optical conditions, thereby attributing observed performance changes specifically to BSF thickness/doping. For clarity and design use, we report baseline vs. near-optimum KPIs ( ), indicating an absolute η gain of  percentage points under AM1.5G, 25 °C. A brief sensitivity note (series resistance; rear interface traps) explains how further increases in resistive or defect-related losses would primarily round the  knee (lowering ) and slightly reduce Voc, consistent with our trends. Overall, these results provide practical guidance for rear-contact engineering in SHJ cells and align with recent literature on passivating selective contacts, while deliberately keeping other surface-property variations outside the present scope.

Keywords: Silicon Heterojunction (SHJ), Back Surface Field (BSF), field-effect passivation, doping optimization, SILVACO-ATLAS, fill factor, photovoltaic efficiency


How to Cite

FAYE, Jacques Joachim, Aly Touré, Mamadou Lamine SAMB, and Dimitry Diassy. 2025. “Numerical Analysis of the Combined Effect of BSF Thickness and Doping on the Performance of an a-Si:H C-Si SHJ Cells Cell”. Physical Science International Journal 29 (6):37-53. https://doi.org/10.9734/psij/2025/v29i6912.

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